November Virtual Technical Meeting
Tuesday – November 10, 2020
Air Liquide's Approach in Electronic Materials: Developing Atomic Layer Deposition (ALD) precursors for Advanced Film Deposition
By Dr. Benjamin Jurcik
Sr. Scientific Director, Air Liquide Innovation Campus of Delaware
Location: Virtual meeting with RingCentral: https://meetings.ringcentral.com/j/1487489258?pwd=bEgwYkRnSGVZZmVEVkNuSlgxTHlKQT09
(Password: 028101; Additional Login details below after the abstract)
Signup link for the event: https://forms.gle/nkNkjw6daT72X4jz8
Networking 6:30 PM, Presentation 7: 00 PM , Cost: Free !!
Abstract: Advanced semiconductor manufacturing processes continue to demand new films deposited by ALD (atomic layer deposition), with carefully tailored characteristics and process constraints. In order to support the semiconductor industry, Air Liquide develops precursors that are crucial contributors permitting these films. This talk will highlight the development strategies Air Liquide has implemented, demonstrating our rapid screening and development approaches with some successes and failures.